femtoEtch

The femtoEtch process with three capability examplary demonstrators.The femtoEtch process with three capability examplary demonstrators.

Translume's femtoEtch™ process is used to precisely shape fused silica substrates.  To start the process, we use a direct-write laser workstation to delineate a path or surface. Using the proper laser parameters, the chemical affinity of the glass along this path or surface is drastically changed. In a subsequent step, the glass substrate is made to react with an etchant that attacks the substrate along the laser-illuminated path. Using this process, we are able to create complex, three-dimensional objects "carved" from blocks of glass.